Speech Title and Abstract

Application of AI in HF Wastewater Treatment System

1. In the process of treating wastewater from semiconductor manufacturing, the main sources of carbon emissions are chemicals, electricity, and consumables. Due to the characteristics of the wastewater, a large amount of chemicals is used to remove harmful substances. The contribution of carbon emissions from wastewater treatment is highest for chemicals, accounting for more than 80% of the carbon emissions from wastewater treatment. Among these, calcium chloride used in hydrofluoric acid wastewater contributes the most, followed by sodium hydroxide and polyaluminum chloride, which are the top three contributors to carbon emissions from chemicals used in wastewater treatment. Therefore, to reduce carbon emissions from chemicals, improvements should be made to the top three chemicals.

2. By utilizing AI assistance, the dosage of chemicals in the hydrofluoric acid wastewater treatment system can be controlled to achieve the goal of reducing chemical usage.